Coating composition, and process for producing photoresist laminate

Abstract

To provide a coating composition which exhibits excellent followability to a difference in level in its application, and which is capable of forming a coating layer having a low refractive index in a short-wavelength region and exhibiting excellent solubility to an alkaline aqueous solution. A coating composition comprising a solvent and a fluorinated polymer (A) which has a unit represented by —[CX1X2—CY(—Rf—COOM)]— and has a number average molecular weight of from 1,000 to 7,500. X1 and X2 are each independently a hydrogen atom, a fluorine atom or a chlorine atom; Y is a hydrogen atom, a fluorine atom, a chlorine atom, a methyl group or a trifluoromethyl group; Rf is a branched perfluoroalkylene group which may contain an etheric oxygen atom between carbon-carbon atoms, or a branched oxyperfluoroalkylene group which may contain an etheric oxygen atom between carbon-carbon atoms; and M is a hydrogen atom or an ammonium ion which may be substituted.

Dependencies are inferred from the claim text.