Substrate processing apparatus

A substrate processing apparatus comprising:

• a first substrate holding device;
• a second substrate holding device provided directly upward of the first substrate holding device;
• a receiving transferring mechanism that receives and transfers a substrate between the first substrate holding device and the second substrate holding device;
• and
• first and second cleaning mechanisms that clean a lower surface of the substrate, wherein
• the first substrate holding device includes
• a suction holder that is configured to be rotatable about a vertical axis and sucks a center portion of the lower surface of the substrate, and
• a first rotation driver that rotates the suction holder,
• the first cleaning mechanism includes a first brush that cleans a peripheral portion of the lower surface of the substrate that is rotated while being held by the suction holder,
• the second substrate holding device includes
• a rotation member configured to be rotatable about the vertical axis,
• a second rotation driver that rotates the rotation member, and
• an abutment holder that holds the substrate by abutting against an outer peripheral end of the substrate that is arranged directly downward of the rotation member, and
• the second cleaning mechanism includes a second brush that cleans a region inward of the peripheral portion of the lower surface of the substrate that is rotated while being held by the abutment holder.