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US 2016/0200702 A1Published application
Salt, acid generator, photoresist composition, and method for producing photoresist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsHiromu SAKAMOTO, Koji ICHIKAWA
Life of this patent
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Abstract
A salt represented by the formula (I): wherein R1 represents a C1 to C12 alkyl group in which a methylene group can be replaced by an oxygen atom or a carbonyl group; Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; A1 represents a lactone ring-containing group which has 4 to 24 carbon atoms; R2 represents an acid-labile group; and “m” represents an integer of 0 to 3.
Claims7
A salt represented by the formula (I):
- wherein
- R1 each independently represents a C1 to C12 alkyl group in which a methylene group can be replaced by an oxygen atom or a carbonyl group;
- Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group;
- A1 represents a lactone ring-containing group which has 4 to 24 carbon atoms;
- R2 represents an acid-labile group;
- and
- “m” represents an integer of 0 to 3.
4 more elements
Dependencies are inferred from the claim text.