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US 2016/0154305 A1Published application
Polyether compound, method for preparing same and photoresist composition
AssigneeBoe Technology Group Co., Ltd.
InventorXuelan WANG
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Abstract
A polyether compound which is as shown in Formula (I), wherein R1 is a polyether backbone of the polyether polyol; R2 is hydrogen or C1˜C5 alkyl; n is 3, 4 or 5. Furthermore, a photoresist composition comprising the polyether compound is disclosed. This photoresist composition is used to make the colored layer in a colored film substrate, in which the polymer film layer thus obtained has a small edge slope angle and is not prone to light leakage.
Claims11
A polyether compound which is as shown in Formula (I):
- wherein R1 is a polyether backbone of the polyether polyol;
- R2 is hydrogen or C1˜C5 alkyl;
- n is 3, 4 or 5.
Dependencies are inferred from the claim text.