Euv light source and exposure apparatus

A method for generating EUV light, comprising:

• spraying a plurality of droplets downwardly to an irradiating position through a spray nozzle array having a plurality of spray nozzles;
• performing a scanning using a laser beam including a first laser beam and a second laser beam reflected by a first reflective mirror and a second reflective mirror to sequentially bombard the droplets arriving at the irradiating position to generate EUV light from each of the plurality of droplets;
• and
• collecting and focusing the EUV light at a central focusing point with an increase output power using a light focusing device comprising a first partial focusing mirror and a second partial focusing mirror.

An exposure apparatus, comprising:

• a base,
• an EUV light source comprising a plurality of spray nozzles for sequentially spraying a plurality of droplets and a light focusing device comprising a first partial focusing mirror and a second partial focusing mirror configured as a exposure light source for a photolithography process;
• a wafer stage configured to hold a wafer for forming patterns by the photolithography process;
• a reticle stage for holing a reticle for the photolithography process;
• and
• a control unit configured to control the exposure apparatus to perform the photolithography process.