Organic photoelectric conversion device and production method thereof
AssigneeSumitomo Chemical Company, Limited
InventorYasunori UETANI
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Abstract
An organic photoelectric conversion device having an anode, a cathode, an active layer disposed between the anode and the cathode, and a hole injection layer disposed between the anode and the active layer, wherein the cathode is an electrode containing an electrically conductive nano-substance, and the hole injection layer is a layer having a residual film rate of 80% or more in measurement of the residual film rate after water rinse treatment.
Claims11
An organic photoelectric conversion device having an anode, a cathode, an active layer disposed between the anode and the cathode, and a hole injection layer disposed between the anode and the active layer, wherein the cathode is an electrode containing an electrically conductive nano-substance, and the hole injection layer is a layer having a residual film rate of 80% or more in measurement of the residual film rate after water rinse treatment shown below:
- <Method of measurement of residual film rate after water rinse treatment>
- On a 1-inch square substrate, a film is formed by spin coating so as to give the same film thickness as in the case of film formation as the hole injection layer in the organic photoelectric conversion device, then, a water rinse treatment in which water is placed in the form of meniscus on the film, allowed to stand still for 30 seconds, then, the film is spun at 4000 rpm to fling away water is conducted. The film thicknesses before and after the water rinse treatment are measured by a contact type thickness meter, and (film thickness after water rinse treatment)/(film thickness before water rinse treatment)×100(%) is defined as the residual film rate after water rinse treatment.
A method of producing an organic photoelectric conversion device having a supporting substrate, an anode and a cathode and having a hole injection layer and an active layer between the anode and the cathode, the method comprising a step of forming a hole injection layer on an anode formed on a supporting substrate, a step of forming an active layer on the hole injection layer, and a step of forming a cathode by coating a coating solution containing water and an electrically conductive nano-substance after the step of forming an active layer, wherein the hole injection layer is a layer having a residual film rate of 80% or more in measurement of the residual film rate after water rinse treatment shown below:
- <Method of measurement of residual film rate after water rinse treatment>
- On a 1-inch square substrate, a film is formed by spin coating so as to give the same film thickness as in the case of film formation as the hole injection layer in the organic photoelectric conversion device, then, a water rinse treatment in which water is placed in the form of meniscus on the film, allowed to stand still for 30 seconds, then, the film is spun at 4000 rpm to fling away water is conducted. The film thicknesses before and after the water rinse treatment are measured by a contact type thickness meter, and (film thickness after water rinse treatment)/(film thickness before water rinse treatment)×100(%) is defined as the residual film rate after water rinse treatment.
Dependencies are inferred from the claim text.