Solid-state imaging apparatus, solid-state imaging apparatus manufacturing method, and electronic apparatus

A manufacturing method of a solid-state imaging apparatus, comprising:

• forming a plurality of photoelectric conversion regions which photoelectrically convert light incident from a rear surface side of a semiconductor substrate;
• forming high impurity concentration regions, on rear surface sides of element isolation regions between the plurality of photoelectric conversion regions arranged in a matrix shape, the high impurity concentration regions having an impurity concentration higher than an impurity concentration of the element isolation regions;
• and
• forming shielding members, on upper surfaces of the high impurity concentration regions, connected to the high impurity concentration regions.