Substrate dividing method
AssigneeHamamatsu Photonics K.K.
InventorsYoshimaro FUJII, Fumitsugu FUKUYO, Kenshi FUKUMITSU, Naoki UCHIYAMA
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AssigneeHamamatsu Photonics K.K.
InventorsYoshimaro FUJII, Fumitsugu FUKUYO, Kenshi FUKUMITSU, Naoki UCHIYAMA
Estimating the term…
A substrate dividing method which can thin and divide a substrate while preventing chipping and cracking from occurring. This substrate dividing method comprises the steps of irradiating a semiconductor substrate 1 having a front face 3 formed with functional devices 19 with laser light while positioning a light-converging point within the substrate, so as to form a modified region including a molten processed region due to multiphoton absorption within the semiconductor substrate 1, and causing the modified region including the molten processed region to form a starting point region for cutting; and grinding a rear face 21 of the semiconductor substrate 1 after the step of forming the starting point region for cutting such that the semiconductor substrate 1 attains a predetermined thickness.
1-6. (canceled)
A method of manufacturing a light emitting device from an object comprising a sapphire substrate having a front face of a (0001) plane of the sapphire substrate and a flat rear face, a gallium nitride compound semiconductor layer formed on the front face of the sapphire substrate, and a plurality of light emitting diodes formed in the gallium nitride compound semiconductor layer in a matrix, the method comprising:
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