Substrate holding method, substrate holding apparatus, exposure apparatus and exposure method
AssigneeNikon Corporation
InventorGo ICHINOSE
Life of this patent
Estimating the term…
Abstract
A wafer holding apparatus for holding a wafer including a wafer holder on which the wafer is placed; and a lift pin that is configured to be lifted up and down with respect to the wafer holder in a direction along a normal line of a placement surface of the wafer, the lift pin includes a tip part, the tip part includes: a bottom part that forms a suction region for sucking a rear surface of the wafer; and a convex part that supports the rear surface of the wafer in the suction region. When a substrate is placed on a target position, it is possible to prevent a local deterioration of flatness of the substrate even if the substrate is large.
Claims29
A substrate holding apparatus for holding a substrate, comprising:
- a substrate holding part on which the substrate is placed;
- and
- a supporting member that is configured to be lifted up and down with respect to the substrate holding part,
- an end part of the supporting member including:
- a suction part that forms a suction region for sucking a rear surface of the substrate;
- and
- a supporting part that supports the rear surface of the substrate in the suction region.
A substrate holding apparatus for holding a substrate, comprising:
- a substrate holding part on which the substrate is placed;
- and
- a supporting member that is configured to be lifted up and down with respect to the substrate holding part,
- an end part of the supporting member including:
- a porous member that includes a space part and allows a pressure of at least one portion of the space part to be a negative pressure to suck a rear surface of the substrate;
- and
- a wall part that is formed to surround at least one portion of the porous member.
A substrate holding apparatus for holding a substrate, comprising:
- a substrate holding part on which the substrate is placed;
- and
- a supporting member that is configured to be lifted up with respect to the substrate holding part,
- an end part of the supporting member including:
- a ring-like first supporting part that supports a rear surface of the substrate;
- and
- a second supporting part that supports the rear surface of the substrate in a region surrounded by the first supporting part.
Dependencies are inferred from the claim text.