Substrate processing apparatus, substrate processing method and storage medium

A substrate processing method of performing a predetermined substrate process on a plurality of target substrates under a vacuum atmosphere using a substrate processing apparatus which includes a plurality of processing parts each configured to perform the substrate process on each of the plurality of target substrates, a gas supply mechanism configured to separately supply a gas into each of the plurality of processing parts, and a single exhaust mechanism configured to collectively exhaust a gas within the plurality of processing parts, the method comprising:

• collectively exhausting, by the single exhaust mechanism, a processing gas within the plurality of processing parts;
• and
• separately supplying, by the gas supply mechanism, the processing gas into the plurality of processing parts such that a difference between internal pressures of the plurality of processing parts is prevented.

A substrate processing method of performing a predetermined substrate process on a plurality of target substrates under a vacuum atmosphere using a substrate processing apparatus which includes a plurality of processing parts each configured to perform the substrate process on each of the plurality of target substrates, a gas supply mechanism configured to separately supply a gas into each of the plurality of processing parts and a single exhaust mechanism configured to collectively exhaust a gas within the plurality of processing parts, the method comprising:

• executing a first mode in which a processing gas within the plurality of processing parts is collectively exhausted and a first gas as the processing gas is supplied into all the plurality of processing parts under the same gas supply condition;
• and
• executing a second mode in which the single exhaust mechanism is controlled to collectively exhaust the processing gas within the plurality of processing parts and the gas supply mechanism is controlled to supply the first gas into some of the plurality of processing parts and to supply a second gas different from the first gas into the other of the plurality of processing parts such that a difference between internal pressures of the plurality of processing parts is prevented.