Substrate liquid processing apparatus, substrate liquid processing method, and computer-readable storage medium storing substrate liquid processing program
AssigneeTokyo Electron Limited
InventorsMitsunori Nakamori, Junichi Kitano, Teruomi Minami
Life of this patent
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Abstract
Disclosed is a substrate liquid processing apparatus. The apparatus includes: a pure water supply unit (a rinse liquid supply unit) configured to supply pure water to a substrate; and a drying liquid supply unit configured to supply a drying liquid having a higher volatility than the pure water to the substrate. The substrate liquid processing apparatus is used to supply the drying liquid having the higher volatility, of which a part contains a silicon-based organic compound, to the substrate, from the drying liquid supply unit.
Claims19
A substrate liquid processing apparatus comprising:
- a pure water supply unit configured to supply pure water to a substrate;
- and
- a drying liquid supply unit configured to supply a drying liquid having a higher volatility than the pure water to the substrate,
- wherein the drying liquid supply unit supplies the drying liquid having the higher volatility, of which a part contains a silicon-based organic compound, to the substrate.
A substrate liquid processing method comprising:
- supplying pure water to a substrate;
- supplying a drying liquid having a higher volatility than the pure water to the substrate;
- and
- drying the substrate,
- wherein the drying of the substrate includes supplying a drying liquid to the substrate, and removing the drying liquid from the substrate, and
- the supplying of the drying liquid includes supplying the drying liquid having the higher volatility, of which a part contains a silicon-based organic compound.
A non-transitory computer-readable storage medium storing a substrate liquid processing program that, when executed, causes a substrate to be processed using a substrate liquid processing apparatus including a processing liquid supply unit configured to supply a processing liquid to the substrate, a rinse liquid supply unit configured to supply a rinse liquid to the substrate, and a drying liquid supply unit configured to supply a drying liquid to the substrate, wherein the substrate liquid processing program causes the drying liquid supply unit to supply the drying liquid of which at least a part contains a silicon-based organic compound to the substrate.
Dependencies are inferred from the claim text.