Systems and Methods for Wet Processing Substrates with Rotating Splash Shield

A substrate processing system comprising:

• a fluid dispenser configured to dispense a processing fluid;
• a substrate support configured to support and rotate a substrate about an axis, the substrate support being disposed below the fluid dispenser such that the processing fluid dispensed by the fluid dispenser flows onto the substrate;
• and
• a splash shield arranged about a periphery of the substrate, the splash shield having an upper portion extending above an upper surface of the substrate and a lower portion extending below a lower surface of the substrate,
• wherein the splash shield is coupled to the substrate support such that the rotation of the substrate about the axis causes rotation of the splash shield about the axis.

A method for processing a substrate, the method comprising:

• providing a substrate having an upper surface and a lower surface;
• positioning a splash shield on at least one side of the substrate, wherein the splash shield has an upper portion extending above the upper surface of the substrate and a lower portion extending below the lower surface of the substrate;
• dispensing a processing liquid onto the upper surface of the substrate;
• rotating the substrate after at least some of the processing liquid is dispensed onto the upper surface of the substrate;
• and
• during the rotating of the substrate, rotating the splash shield.