Sputtering target and method of producing thin film by using sputtering target
AssigneeAsahi Glass Company, Limited
InventorsKazuhiro ITO, Satoru WATANABE, Naomichi MIYAKAWA, Toshinari WATANABE, Akira MITSUI
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Abstract
There is provided a sputtering target for forming an amorphous film, the sputtering target including an electrically conductive mayenite compound, wherein electron density of the electrically conductive mayenite compound is greater than or equal to 3×1020 cm−3, and wherein the electrically conductive mayenite compound includes one or more elements that are selected from a group including C, Fe, Na, and Zr.
Claims8
A sputtering target for forming an amorphous film, the sputtering target including an electrically conductive mayenite compound,
- wherein electron density of the electrically conductive mayenite compound is greater than or equal to 3×1020 cm−3, and
- wherein the electrically conductive mayenite compound includes one or more elements that are selected from a group including C, Fe, Na, and Zr.
A method of producing a thin film of an electride of an amorphous oxide including a calcium atom and an aluminum atom,
- wherein the thin film of the electride of the amorphous oxide including the calcium atom and the aluminum atom is formed on a substrate by a sputtering method while using a sputtering target under a low oxygen partial pressure atmosphere,
- wherein the sputtering target includes an electrically conductive mayenite compound,
- wherein electron density of the electrically conductive mayenite compound is greater than or equal to 3×1020 cm−3, and
- wherein the electrically conductive mayenite compound includes one or more elements that are selected from a group including C, Fe, Na, and Zr.
Dependencies are inferred from the claim text.