System and Method for Detecting a Process Point in Multi-Mode Pulse Processes

A multi-mode pulsing plasma processing system comprising:

• a plasma processing chamber configured for performing plasma processes on a wafer, the plasma processing chamber including a plurality of sensors, each one of the plurality of sensors configured to detect at least one corresponding output process variable;
• at least one bias source;
• at least one RF source;
• at least one gas source, the least one bias source, the at least one RF source and the at least one gas source being coupled to the plasma processing chamber;
• and
• a controller coupled to each of the plasma processing chamber;
• the plurality of sensors, the least one bias source, the at least one RF source and the at least one gas source, the controller including:
• at least one multi-mode pulsing plasma processing recipe;
• and
• at least one multi-mode pulsing plasma processing point detection logic embodied on computer readable medium including:
• computer executable logic for applying the multi-mode pulsing process to a selected wafer in the plasma process chamber, the multi-mode pulsing process including a plurality of cycles, each one of the plurality of cycles including at least one of a plurality of different phases;
• computer executable logic for collecting the at least one process output variable for a selected at least one phase of the plurality of phases, during the plurality of cycles for the selected wafer;
• computer executable logic for analyzing the collected at least one process output variable;
• and
• computer executable logic for identifying the selected process point from the analyzed at least one process output variable.