Patterning process and chemically amplified negative resist composition
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsJun Hatakeyama, Masaki Ohashi
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Abstract
A negative pattern is formed by coating a resist composition comprising a polymer comprising recurring units having a carboxyl and/or hydroxyl group optionally substituted with an acid labile group and an acid generator capable of generating fluorinated tetraphenylborate onto a substrate, prebaking, exposing, baking, and developing in an organic solvent so that the unexposed region of resist film is dissolved away and the exposed region of resist film is not dissolved. The resist composition exhibits a high sensitivity and high dissolution contrast during organic solvent development and forms a fine hole or trench pattern via positive/negative reversal.
Claims9
A pattern forming process comprising the steps of:
- applying a resist composition onto a substrate,
- prebaking the composition to form a resist film,
- exposing a selected region of the resist film to high-energy radiation,
- baking, and
- developing the exposed resist film in an organic solvent-based developer to form a negative pattern wherein the unexposed region of resist film is dissolved away and the exposed region of resist film is not dissolved,
- said resist composition comprising a polymer comprising recurring units having a carboxyl group which may or may not be substituted with an acid labile group and/or a hydroxyl group which may or may not be substituted with an acid labile group excluding α-trifluoromethylhydroxy, and an acid generator capable of generating fluorinated tetraphenylborate.
A chemically amplified negative resist composition comprising
- a polymer comprising recurring units having a carboxyl group which may or may not be substituted with an acid labile group and/or a hydroxyl group which may or may not be substituted with an acid labile group excluding α-trifluoromethylhydroxy, and
- an acid generator capable of generating fluorinated tetraphenylborate, having the general formula (1)-1 or (1)-2:
- wherein R101a, R101b, and R101c are each independently a straight, branched or cyclic C1-C12 alkyl, alkenyl, oxoalkyl or oxoalkenyl, C6-C20 aryl, or C7-C20 aralkyl or aryloxoalkyl group, in which some or all hydrogen atoms may be substituted by alkyl, halo-alkyl, halogen, hydroxy, carboxyl, alkoxycarbonyl, alkoxy, acyl, acyloxy, nitro or amino, or which may contain ether, ester, lactone ring, amide, lactam or sultone ring, or R101b, and R101c may form a ring, each of R101b and R101c is a C1-C14 alkylene or arylene group when they form a ring, R102 to R105 are fluorine or trifluoromethyl, p, q, r and s are an integer of 1 to 5.
Dependencies are inferred from the claim text.