Optical mask

Abstract

Embodiments of an optical mask include a base substrate having one surface and an opposed other surface; a reflection pattern layer formed on the one surface of the base substrate, the reflection pattern layer having one surface and an opposed other surface and including a cut portion which light radiated from the other surface of the base substrate penetrates and a reflection unit reflecting the light; and a photothermal conversion pattern layer in a region overlapped with the cut portion. The photothermal conversion pattern layer is divided into a first region having high light absorptance and a second region having lower light absorptance than the first region. The different regions of the photothermal conversion pattern layer absorb incident light and convert the absorbed light into heat to sublimate a transfer material at different rates. Differential optical absorptance is achieved with an offset interference, wherein the first region has a structure of a first metal layer, an oxide layer, and a second metal layer, and the second region uses fewer of these layers.

Dependencies are inferred from the claim text.