Display device and manufacturing method thereof

A method for manufacturing a display device, comprising:

• forming a thin-film transistor on a substrate;
• forming a first insulating layer on the thin-film transistor;
• forming a pixel electrode on the first insulating layer, the pixel electrode being connected to the thin-film transistor formed on the first insulating layer;
• forming a sacrificial layer on the pixel electrode;
• forming a common electrode on the sacrificial layer;
• forming a roof layer by coating an organic material on the common electrode and patterning the coated organic material;
• exposing the sacrificial layer by patterning the common electrode using the roof layer as a mask;
• forming a third insulating layer on the roof layer;
• forming a microcavity and an injection hole between the pixel electrode and the common electrode by removing the exposed sacrificial layer;
• forming a first convex embossing pattern in an upper surface of the third insulating layer;
• forming a liquid crystal layer by injecting a liquid crystal material into the microcavity;
• and
• sealing the microcavity by forming an overcoat on the third insulating layer and the injection hole.