Lenticular wafer inspection
AssigneeExnodes Inc.
InventorSri Rama Prasanna Pavani
Life of this patent
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Abstract
A system and method for inspecting a surface, comprising: illuminating said surface with an electromagnetic radiation to generate scattered radiation from features of said surface; inducing a change in phase to said scattered radiation for reducing divergence of said scattered radiation and for redirecting said scattered radiation towards a predetermined spatial region; focusing after said radiation has propagated to said spatial region; capturing an image of radiation, whereby said features of said surface are detected in said image of radiation.
Claims20
A system for inspecting a surface, comprising:
- a. an electromagnetic radiation incident on said surface to generate scattered radiation from features of said surface;
- b. a micro-optic layer disposed to induce a change in phase for reducing divergence of said scattered radiation and for redirecting said scattered radiation towards a predetermined spatial region;
- c. an imaging optic located in said spatial region to focus said radiation from said micro-optic layer;
- and
- d. an image sensor positioned to detect radiation from imaging optic to generate an image of radiation,
- e. whereby said features of said surface are detected in said image of radiation.
A method for inspecting a surface, comprising:
- a. illuminating said surface with an electromagnetic radiation to generate scattered radiation from features of said surface;
- b. inducing a change in phase to said scattered radiation for reducing divergence of said scattered radiation and for redirecting said scattered radiation towards a predetermined spatial region;
- c. focusing after said radiation has propagated to said spatial region;
- d. capturing an image of radiation,
- whereby said features of said surface are detected in said image of radiation.
Dependencies are inferred from the claim text.