Microchip and film forming method for metal thin film of microchip
AssigneeUshio Denki Kabushiki Kaisha
InventorsKinichi MORITA, Toshikazu KAWAGUCHI
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Abstract
Disclosed herein are a microchip provided with a titanium oxide film between a glass substrate and a metal thin film; and a method for forming the metal thin film and the titanium oxide film on the glass substrate of the microchip. The microchip has a second microchip substrate that has the metal thin film inside a channel, and the titanium oxide film, which has a low extinction coefficient, is provided as a buffer layer between the substrate and the metal thin film such as a gold film.
Claims5
A microchip comprising:
- a substrate made of glass on which metal thin film is formed;
- a channel formed in a space including the metal thin film;
- and
- a titanium oxide film provided between the substrate and the metal thin film, the titanium oxide film having a rutile type structure and an anatase type structure being mixed;
- the titanium oxide film contacting the substrate on one face of the titanium oxide film, and contacting the metal thin film with the other face of the titanium oxide film.
A method of forming a metal thin film in a microchip including a substrate made of glass on which the metal thin film is formed, and a channel formed in a space including the metal thin film, the method comprising:
- irradiating a surface of the substrate with light including vacuum ultraviolet light with a wavelength equal to or less than 200 nm under an ambient atmosphere containing oxygen and moisture;
- immersing the substrate in titanium ion solution and forming a titanium oxide film having a rutile type structure and an anatase type structure being mixed on a vacuum ultraviolet light irradiated face of the substrate;
- and
- depositing the metal thin film on the surface of the substrate on which the titanium oxide film is formed.
Dependencies are inferred from the claim text.