Substrate processing method and template
AssigneeTokyo Electron Limited
InventorsHaruo IWATSU, Tomohisa HOSHINO, Toshiyuki MATSUMOTO
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AssigneeTokyo Electron Limited
InventorsHaruo IWATSU, Tomohisa HOSHINO, Toshiyuki MATSUMOTO
Estimating the term…
A substrate processing method of performing a predetermined processing by supplying a processing liquid to a processing region of a substrate and using processing target ions in the processing liquid, includes: arranging a template to face the substrate, the template including a passage configured to distribute the processing liquid, a direct electrode, and an indirect electrode, and the substrate including a counter electrode, which matches with the direct electrode, installed in the processing region; supplying the processing liquid to the processing region through the passage; and performing the predetermined processing on the substrate by applying a voltage to the indirect electrode to cause the processing target ions to migrate to the counter electrode side while applying a voltage between the direct electrode and the counter electrode to oxidize or reduce the processing target ions that have migrated to the counter electrode side.
A substrate processing method of performing a predetermined processing by supplying a processing liquid to a processing region of a substrate and using processing target ions in the processing liquid, the method comprising:
A template for use in performing a predetermined processing by supplying a processing liquid to a processing region of a substrate and using processing target ions in the processing liquid, the template comprising:
Dependencies are inferred from the claim text.