Method and apparatus for producing nanostructures, and substrate structure including nanostructures
AssigneesKyoto University, Hitachi, Ltd.
InventorsHisashi TANIE, Takashi SUMIGAWA, Takayuki KITAMURA
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AssigneesKyoto University, Hitachi, Ltd.
InventorsHisashi TANIE, Takashi SUMIGAWA, Takayuki KITAMURA
Estimating the term…
Provided are a method and an apparatus for producing nanostructures. The method and the apparatus can form the nanostructures having fine dimensions from a wider variety of materials. Also provided is a substrate structure including nanostructures formed from a material that is industrially widely applicable. A method forms a plurality of nanostructures on a flat surface of a substrate. The method includes the step a) of evaporating a main material for the nanostructures onto the flat surface of the substrate. In the step a), the substrate is controlled to have an absolute temperature equal to or lower than 0.25 time the melting point (absolute temperature) of the main material for the nanostructures. This enables the formation of fine nanostructures having a desired shape from a desired material.
A method for producing nanostructures, the method comprising the step of
An apparatus for producing nanostructures, the apparatus comprising
A nanostructure-containing substrate structure comprising:
Dependencies are inferred from the claim text.