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US 2016/0108512 A1Published application
Method of depositing tantalum to form a tantalum coating
AssigneeEndurance Technologies, Inc.
InventorEugene Medvedovski
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Abstract
A method of depositing tantalum to form a tantalum coating on substrates is provided. The method comprises preparing a tantalum-containing mixture having a tantalum donor, a halide activator, and a tantalum halide activator; preparing a substrate for deposition of the tantalum from the tantalum-containing mixture; and heating the substrate and the tantalum-containing mixture to a given temperature to deposit the tantalum on the substrate.
Claims30
A method comprising:
- preparing a tantalum-containing mixture having:
- a tantalum donor;
- a halide activator;
- and,
- a tantalum halide activator;
- and
- preparing a substrate for deposition of tantalum from the tantalum-containing mixture;
- and,
- heating the substrate and the tantalum-containing mixture to a given temperature to deposit the tantalum on the substrate.
6 more elements
A metallic substrate having a coating, the coating comprising:
- an outer tantalum-rich intermetallide layer having a weight percent of tantalum greater than about 60%, the outer tantalum-rich intermetallide layer protecting the metallic substrate against corrosion;
- and,
- an intermediate transition layer having an intermetallide of tantalum and at least one metal from the metallic substrate, the intermediate transition layer having a weight percent of tantalum in a range of about 35% to about 55%, the intermediate transition layer bonding the outer tantalum-rich intermetallide layer to the metallic substrate.
Dependencies are inferred from the claim text.