US 2016/0108286 A1 · SLURRY FOR CHEMICAL MECHANICAL POLISHING OF COBALT

Abstract

The invention provides a chemical-mechanical polishing composition including (a) an abrasive comprising alumina particles, silica particles, or a combination thereof, (b) a rate accelerator comprising a phosphonic acid, an N-heterocyclic compound, or a combination thereof, (c) a corrosion inhibitor comprising an amphoteric surfactant, a sulfonate, a phosphonate, a carboxylate, a fatty acid amino acid, an amine, an amide, or a combination thereof, (d) an oxidizing agent, and (e) an aqueous carrier. The invention also provides a method of polishing a substrate, especially a substrate comprising a cobalt layer, with the polishing composition.

Claims22

Dependent claims

A chemical-mechanical polishing composition comprising:

(a) about 0.1 wt. % to about 13 wt. % of an abrasive comprising alumina particles, silica particles, or a combination thereof,
(b) about 0.05 wt. % to about 5 wt. % of a rate accelerator comprising a phosphonic acid, an N-heterocyclic compound, or a combination thereof,
(c) a corrosion inhibitor comprising an amphoteric surfactant, a sulfonate, a phosphonate, a carboxylate, a fatty acid amino acid, an amine, an amide, or a combination thereof,
(d) about 0.1 wt. % to about 5 wt. % of an oxidizing agent, and
(e) an aqueous carrier.

2 more elements

Dependencies are inferred from the claim text.

Slurry for chemical mechanical polishing of cobalt

Life of this patent

Slurry for chemical mechanical polishing of cobalt

Life of this patent

Abstract

Claims22