Corrosion resistant abatement system
AssigneeApplied Materials, Inc.
InventorsGovinda RAJ, Monika AGARWAL, Hamid MOHIUDDIN, Kadthala R. NARENDRNATH
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AssigneeApplied Materials, Inc.
InventorsGovinda RAJ, Monika AGARWAL, Hamid MOHIUDDIN, Kadthala R. NARENDRNATH
Estimating the term…
Embodiments disclosed herein include a plasma source, and an abatement system for abating compounds produced in semiconductor processes. In one embodiment, a plasma source is disclosed. The plasma source includes a body having an inlet and an outlet, and the inlet and the outlet are fluidly coupled within the body. The body further includes inside surfaces, and the inside surfaces are coated with yttrium oxide or diamond-like carbon. The plasma source further includes a flow splitter disposed in the body in a position that formed two flow paths between the inlet and the outlet, and a plasma generator disposed in a position operable to form a plasma within the body between the flow splitter and inside surfaces of the body.
A plasma source, comprising:
An abatement system, comprising:
A plasma source, comprising:
The plasma source of 18, wherein each of the plurality of parallel passages is substantially perpendicular to a central axis of the body.
Dependencies are inferred from the claim text.