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AssigneeJc Korea Corp.
InventorsHyun Surk KIM, Kyung Sik Choi, Ju Young Park, Jeong Rim Choi, Bo Mi Kim
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A composition for nail polish removal is disclosed. The composition for nail polish removal is applied to a nail to form a layer for nail polish removal, and then a UV gel is applied to the layer for nail polish removal or an acrylic resin is applied to the layer for nail polish removal to extend the nail. Therefore, the UV gel or the acrylic resin can be peeled off in a simple manner without the use of a special tool or the need to perform a special operation. In addition, the risk of damage to the nail can be greatly reduced. Also disclosed is a kit for nail polish removal including the composition.
A composition for nail polish removal comprising (a) a polymer solution selected from a polyurethane solution, an aqueous solution of polyvinyl alcohol, a poly(meth)acrylate solution, and mixtures thereof wherein the polyurethane solution is composed of 25 to 40% by weight of polyurethane and 60 to 75% by weight of water, the aqueous solution of polyvinyl alcohol is composed of 1 to 25% by weight of polyvinyl alcohol and 75 to 99% by weight of water, and the poly(meth)acrylate solution is composed of 5 to 50% by weight of poly(meth)acrylate and 50 to 95% by weight of water.
A kit for nail polish removal comprising (I) a composition for nail polish removal and (II) an instruction manual on how to use the composition for nail polish removal.
A method for nail care comprising (A) applying a composition for nail polish removal to a nail to form a layer for nail polish removal and (B) forming a nail polish layer on the layer for nail polish removal.
Dependencies are inferred from the claim text.