Semiconductor Device and a Method of Manufacturing Same
AssigneesHitachi, Ltd., Hitachi Power Semiconductor Device, Ltd.
InventorsJiro HASEGAWA, Yoshiaki TOYOTA
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Abstract
With an SiC semiconductor device, the surface of a termination region is covered with a passivation film, and the passivation film is provided with a thermal silicon oxide film which is in contact with the surface of the termination region, a CVD silicon oxide film deposited on the thermal silicon oxide film so as to be in contact with the thermal silicon oxide film, and a CVD silicon oxide film deposed on the CVD silicon oxide film so as to be in contact with the CVD silicon oxide film. By so doing, an electric field applied on the passivation film is relaxed, while production cost is reduced.
Claims7
A semiconductor device composed of a semiconductor SiC, including a termination region disposed around an active region, an upper surface of the termination region being covered with a passivation film, wherein the passivation film comprises:
- a first silicon oxide film in contact with the upper surface of the termination region;
- a second silicon oxide film deposited on the first silicon oxide film, so as to be in contact with the first silicon oxide film;
- and
- a third silicon oxide film deposited on the second silicon oxide film, so as to be in contact with the second silicon oxide film.
A method of manufacturing a semiconductor device composed of a semiconductor SiC, including a termination region disposed around an active region, an upper surface of the termination region being covered with a passivation film, the method comprising:
- a first step of forming a sacrificial oxide film on a semiconductor surface with thermal oxidation;
- a second step of forming a first silicon oxide film functioning as the passivation film, over the termination region, by making use of the sacrificial oxide film formed in the first step;
- a third step of forming a second silicon oxide film functioning as the passivation film by CVD over the first silicon oxide film formed in the second step;
- and
- a fourth step of forming a third silicon oxide film functioning as the passivation film by CVD over the second silicon oxide film formed in the third step.
Dependencies are inferred from the claim text.