Local dry etching apparatus

A local dry etching apparatus of locally fabricating the surface of a workpiece by dry etching, comprising;

• a single vacuum chamber,
• a plurality of gas introduction units each including a discharge tube having an injection port opened in the vacuum chamber,
• a single workpiece table disposed in the vacuum chamber for mounting a workpiece,
• a table driving device for driving the workpiece table,
• a table driving control device for controlling the table driving device,
• a gas supply device for supplying a raw material gas to the gas introduction units,
• a single electromagnetic wave oscillator,
• plasma generation portions each provided for corresponding discharge tubes of the gas introduction units, and
• an electromagnetic wave transmission unit having an electromagnetic wave switching unit configured to switch an electromagnetic wave such that one of the plasma generation portions is irradiated with the electromagnetic wave generated by the single electromagnetic wave oscillator,
• wherein the gas introduction units have fabrication characteristics different from each other.