Ag alloy film for reflecting electrode or wiring electrode, reflecting electrode or wiring electrode, and ag alloy sputtering target
AssigneeKabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)
InventorsYoko SHIDA, Hiroshi GOTO, Mototaka OCHI
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Abstract
An Ag alloy film used for a reflecting electrode or an interconnection electrode, the Ag alloy film exhibiting low electrical resistivity and high reflectivity and having exceptional oxidation resistance under cleaning treatments such as an O2 plasma treatment or UV irradiation, wherein the Ag alloy film contains either In in an amount of larger than 2.0 atomic % to 2.7 atomic % or smaller; or Zn in an amount of larger than 2.0 atomic % to 3.5 atomic % or smaller; or both. The Ag alloy film may further contain Bi in an amount of 0.01 to 1.0 atomic %.
Claims11
An Ag alloy film comprising:
- In in an amount larger than 2.0 atomic % and smaller than or equal to 2.7 atomic %, and
- Bi in an amount larger than or equal to 0.01 atomic % and smaller than or equal to 1.0 atomic %.
2-12. (canceled)
Dependencies are inferred from the claim text.