Method of generating write data, multi charged particle beam writing apparatus, and pattern inspection apparatus

A multi charged particle beam writing apparatus comprising:

• a writing unit that forms multiple beams including a plurality of charged particle beams, individually allows the multiple beams to enter an ON mode or an OFF mode, and irradiates an object with the charged particle beams to write a pattern, and
• a control unit that divides a polygonal figure included in design data into a plurality of trapezoids each of which has at least one pair of parallel opposite sides extending in a first direction and which are connected in a second direction orthogonal to the first direction such that adjacent trapezoids share the side extending in the first direction as a common side, and generates the write data including position information of a common vertex of a first trapezoid and a second trapezoid next to the first trapezoid expressed by a displacement in the first and second directions from a position of a common vertex of the second trapezoid and a third trapezoid next to the second trapezoid, and controls the writing unit in accordance with the write data.

A pattern inspection apparatus comprising:

• a conversion unit that divides a polygonal figure included in design data into a plurality of trapezoids each of which has at least one pair of parallel opposite sides extending in a first direction and which are connected in a second direction orthogonal to the first direction such that adjacent trapezoids share the side extending in the first direction as a common side, and generates first write data including expresses position information of a common vertex of a first trapezoid and a second trapezoid next to the first trapezoid expressed by a displacement in the first and second directions from a position of a common vertex of the second trapezoid and a third trapezoid next to the second trapezoid, and
• an inspection unit that compares the first write data and second write data produced based on a pattern written on an object by irradiation with charged particle beams to inspect the pattern.