Fabrication of low defectivity electrochromic devices

A method of fabricating an electrochromic device, the method comprising:

• a. forming a first conductive layer on a substrate or receiving the substrate with the first conductive layer formed thereon;
• b. cutting the first conductive layer with a laser so that a first portion of the first conductive layer is electrically isolated from a second portion of the first conductive layer by a laser trench;
• c. depositing an electrochromic layer or a counter electrode layer on the first and second portions of the first conductive layer and in the laser trench;
• d. depositing an ion conductor layer on the electrochromic layer or the counter electrode layer deposited in (c);
• e. depositing the other of the electrochromic layer and the counter electrode layer, whichever was not deposited in (c), on the ion conductor layer;
• and
• f. depositing a second conductive layer on the other of the electrochromic layer and the counter electrode layer.

A method of fabricating an electrochromic device, the method comprising:

• a. depositing a first transparent conductive oxide layer on a transparent substrate;
• b. cutting the first transparent conductive oxide layer with a laser so that a first portion of the first transparent conductive oxide layer is electrically isolated from a second portion of the first transparent conductive oxide layer by a laser trench;
• c. depositing an electrochromic layer on the first and second portions of the first transparent conductive oxide layer and in the laser trench;
• d. depositing an ion conductor layer on the electrochromic layer;
• e. depositing a counter electrode layer on the ion conductor layer;
• and
• f. depositing a second transparent conductive layer on the counter electrode layer.

A deposition system comprising:

• (a) a laser scribing station comprising a laser for performing a laser scribe on a first conductive layer on a substrate, wherein the laser scribe cuts the first conductive layer with the laser so that a first portion of the first conductive layer is electrically isolated from a second portion of the first conductive layer by a laser trench;
• (b) a plurality of deposition stations arranged in series and operable to receive the substrate with the laser trench and pass the substrate from one station to an adjacent station, wherein the plurality of deposition stations comprises:
• (i) a first deposition station containing a material source for depositing an electrochromic layer, and
• (ii) a second deposition station containing a material source for depositing a counter electrode layer;
• and
• (c) a controller comprising program instructions for passing the substrate through the plurality of deposition stations in a manner that deposits on the substrate at least the electrochromic layer and the counter electrode layer to form a stack such that the electrochromic layer or the counter electrode layer is deposited on the first and second portions of the first conductive layer and in the laser trench.