Coating system including alternating layers of amorphous silica and amorphous silicon nitride
AssigneeROLLS-ROYCE plc
InventorsSungbo Shim, Sean E. Landwehr
Life of this patent
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Abstract
In some examples, an article may include a substrate and a coating on the substrate. The substrate may include a superalloy, a ceramic, or a ceramic matrix composite. The coating may include a first set of layers and a second set of layers. At least one layer of the first set of layers is between two layers of the second set of layers. The at least one layer of the first set of layers comprises one of amorphous silica or silicon nitride, and the at least two layers of the second set of layers comprises the other of amorphous silica or silicon nitride.
Claims29
An article comprising:
- a substrate;
- a coating on the substrate;
- wherein the coating comprises a first set of layers and a second set of layers;
- wherein at least one layer of the first set of layers is between two layers of the second set of layers;
- wherein the at least one layer of the first set of layers comprises one of amorphous silica or silicon nitride;
- and
- wherein the at least two layers of the second set of layers comprises the other of amorphous silica or silicon nitride.
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11-12. (canceled)
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A system comprising:
- a first component comprising an alloy substrate;
- a second component comprising a ceramic or a CMC substrate;
- wherein at least a portion of the first component is in contact with at least a portion of the second component;
- wherein the at least a portion of the first component, the at least a portion of the second component, or both comprises a coating;
- wherein the coating comprises a first set of layers and a second set of layers;
- wherein at least one layer of the first set of layers is between two layers of the second set of layers;
- wherein the at least one layer of the first set of layers comprises one of amorphous silica or silicon nitride;
- and
- wherein the at least two layers of the second set of layers comprises the other of amorphous silica or silicon nitride.
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22-25. (canceled)
A method comprising:
- depositing, using at least one of chemical vapor deposition or plasma-enhanced chemical vapor deposition, a plurality of layers comprising an amorphous microstructure on a substrate;
- wherein the plurality of layers comprises a first set of layers and a second set of layers;
- wherein at least one layer of the first set of layers is between two layers of the second set of layers;
- wherein the at least one layer of the first set of layers comprises one of amorphous silica or silicon nitride;
- and
- wherein the at least two layers of the second set of layers comprises the other of amorphous silica or silicon nitride.
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33-34. (canceled)
Dependencies are inferred from the claim text.