Physical vapor deposition apparatus and method of depositing phase-change materials using the same

A physical vapor deposition (PVD) apparatus for forming a phase-changeable layer, the PVD apparatus comprising:

• a process chamber including,
• a loading chamber configured to load a substrate, and
• a depositing chamber configured to deposit ion particles of a phase-changeable material onto the substrate;
• a target member on an upper portion of the depositing chamber, the target member configured to provide the ion particles of the phase-changeable material, the ion particles reacting with process gases in a plasma state;
• a plasma generator configured to generate a process gas plasma from the process gases;
• a chuck on a lower portion of the depositing chamber and holding the substrate, the chuck including,
• a heater configured to heat the substrate, and
• at least one electrode configured to guide the ion particles of the phase-changeable material to the substrate;
• and
• a supplementary heater in the process chamber, the supplementary heater configured to transfer radiant heat around the substrate.