Reverse osmosis for purifying mixtures of hydrofluoric acid and nitric acid
AssigneeSolvay SA
InventorJean-Marie COLLARD
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Abstract
Disclosed is a method of purifying a solution containing hydrofluoric acid, nitric acid and at least one silicon impurity by treating the solution with at least one reverse osmosis membrane. According to the method of the present invention, silicon impurities contained in the solution containing hydrofluoric acid and nitric acid can be selectively removed or reduced. This method can be advantageously used in the photovoltaic industry or in the battery component industry.
Claims20
A method of purifying a solution containing hydrofluoric acid, nitric acid and at least one silicon impurity, the method comprising treating the solution with at least one reverse osmosis membrane.
Dependencies are inferred from the claim text.