Chemical mechanical polishing pad with internal channels

A polishing pad for chemical mechanical polishing comprising:

• a base region having a supporting surface;
• a plurality of polishing features forming a polishing surface, the polishing surface opposing the supporting surface;
• and
• one or more plenums formed in an interior region of the polishing pad, wherein each of the one or more plenums is fluidly coupled to a port.

A polishing device for chemical mechanical polishing comprising:

• a platen comprising:
• a shaft;
• a platen plate supported by the shaft, the platen plate having a mounting surface;
• and
• one or more conduits distributed through the shaft and the platen plate;
• a polishing pad comprising:
• a base region having a supporting surface for contacting the mounting surface of the platen;
• a plurality of polishing features forming a polishing surface, the polishing surface opposing the supporting surface;
• one or more channels formed in an interior of the polishing pad, the one or more channels extending at least 15 degrees around a center of the polishing pad;
• and
• a seal providing a sealed connection between the one or more conduits of the platen and the one or more channels of the polishing pad.