Method and system for designing semiconductor device

A method of designing a semiconductor device, the method comprising:

• providing a standard cell layout which comprises an active region and a dummy region;
• determining first and second fin pitches such that a plurality of active fins having the first fin pitch are placed in the active region and that a plurality of dummy fins having the second fin pitch are placed in the dummy region;
• determining a third fin pitch between an active fin of the plurality of active fins and a dummy fin of the plurality of dummy fins such that dummy fins are respectively placed on boundary lines of the standard cell layout which face each other in a direction of a cell height;
• and
• placing the active fins in the active region and the dummy fins in the dummy region using the first through third fin pitches.

A system for designing a semiconductor device, the system comprising:

• a processor;
• and
• a storage which stores an operation module executed using the processor,
• wherein the operation module receives a standard cell layout which comprises an active region and a dummy region, determines a first fin pitch between a first active fin and a second active fin in the active region and a second fin pitch between a first dummy fin and a second dummy fin in the dummy region, and places the first and second active fins in the active region and the first and second dummy fins in the dummy region using the first and second fin pitches.