Optical apparatus and manufacturing method using the same

A manufacturing method, comprising:

• coating a photosensitive layer on a substrate;
• providing the substrate on a stage of an optical apparatus;
• exposing the photosensitive layer to a light pattern by the optical apparatus;
• and
• developing the photosensitive layer to form a photosensitive pattern,
• wherein the optical apparatus comprises,
• a stage configured to support the substrate,
• a first optical system configured to provide a first light onto the substrate,
• a gantry configured to support the first optical system to transfer the first optical system above the stage, and
• a second optical system disposed between the gantry and the stage to detect displacement of the first optical system,
• wherein the second optical system comprises:
• a beam source configured to generate a second light that is different from the first light;
• and
• a sensor array configured to receive the second light provided to the first optical system to detect the displacement of the first optical system.

A manufacturing method, comprising:

• forming a pattern on a substrate;
• providing the substrate on a stage of an optical apparatus;
• and
• inspecting the pattern by the optical apparatus,
• wherein the optical apparatus comprises,
• a stage configured to support the substrate,
• a first optical system configured to provide a first light onto the substrate,
• a gantry configured to support the first optical system to transfer the first optical system above the stage, and
• a second optical system disposed between the gantry and the stage to detect displacement of the first optical system,
• wherein the second optical system comprises:
• a beam source configured to generate a second light that is different from the first light;
• and
• a sensor array configured to receive the second light provided to the first optical system to detect the displacement of the first optical system.