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US 2016/0097976 A1Published application
Photosensitive material and method of lithography
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorChing-Yu Chang
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Abstract
Photosensitive materials and method of forming a pattern that include providing a composition of a component of a photosensitive material that is operable to float to a top region of a layer formed from the photosensitive material. In an example, a photosensitive layer includes a first component having a fluorine atom (e.g., alkyl fluoride group). After forming the photosensitive layer, the first component floats to a top surface of the photosensitive layer. Thereafter, the photosensitive layer is patterned.
Claims12
A method of fabricating a semiconductor device, comprising:
- determining a profile issue associated with formation of a first feature;
- determining a photosensitive material formulation to compensate for the profile issue;
- forming a layer of the photosensitive material having the determined photosensitive material formulation on a substrate;
- and
- patterning the layer of the photosensitive material to provide the first feature.
2 more elements
Dependencies are inferred from the claim text.