An electro-optic element

An electro-optic element comprising:

• a first substrate having first and second surfaces;
• a second substrate having third and fourth surfaces, the second and third surfaces disposed in a parallel and spaced-apart relationships such to form a gap therebetween;
• a sealing material circumferentially disposed along a perimeter of the third surface to sealingly affix the second and third surfaces together to form a chamber therebetween;
• and
• an electro-optic medium in the chamber;
• wherein at least one of the second and third surfaces carries a transparent conducting oxide (TCO);
• wherein the at least one of the second and third surfaces carried a metal-containing layer;
• wherein the metal-containing layer is substantially absent at at least a portion of a surface of the TCO to define an opening and the TCO layer is present in substantially all of the opening;
• and
• wherein the TCO remains relatively undamaged.

A method for fabrication of an electro optic element, the method comprising:

• depositing a first metal-containing layer onto a first transparent substrate;
• laser ablating the first metal-containing layer from a portion of an area of the first transparent substrate to create an opening in the metal-containing layer in said portion;
• depositing a transparent conductive oxide (TCO) layer onto the first substrate to cover a surface of the transparent substrate corresponding to said portion;
• wherein the opening in the metal-containing layer is comprises at least one of:
• a sharp or abruptly terminated edge;
• a haze value, of a substrate carrying the metal-containing layer defining the opening and measured in the opening, of less than 0.5%;
• an absorption value, of a substrate carrying the metal-containing layer defining the opening and measured in the opening, of less than 10%;
• and
• a metallic residue that covers less than 2% of an area of a surface of the opening.

A method for fabrication of an electro optic element, the method comprising:

• depositing a first transparent conductive oxide (TCO) layer onto a transparent substrate;
• depositing a metal-containing layer onto the TCO layer;
• and
• laser ablating a portion of an area of the transparent substrate covered by the metal-containing layer to create an opening in the metal-containing layer;
• wherein the opening in the metal-containing layer is characterized by at least one of:
• a sharp or abruptly terminated edge;
• a haze value, of a substrate carrying the metal-containing layer defining the opening and measured in the opening, of less than 0.5%;
• an absorption value, of a substrate carrying the metal-containing layer defining the opening and measured in the opening, of less than 10%;
• and
• a metallic residue that covers less than 2% of an area of a surface of the opening.