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US 2016/0097122 A1Published application
Top lamp module for carousel deposition chamber
AssigneeApplied Materials, Inc.
InventorsJoseph Yudovsky, Robert T. Trujillo, Kevin Griffin, Garry K. Kwong, Kallol Bera, Li-Qun Xia, Mandyam Sriram
Life of this patent
Estimating the term…
Abstract
A heating module for use in a substrate processing chamber. The heating module having a housing with a heat source therein. The heating module can be part of a gas distribution assembly positioned above a susceptor assembly to heat the top surface of the susceptor and wafers directly. The heating module can have constant or variable power output. Processing chambers and methods of processing a wafer using the heating module are described.
Claims20
A processing chamber comprising:
- a circular gas distribution assembly positioned within the processing chamber, the gas distribution assembly comprising a plurality of elongate gas ports in a front face of the gas distribution assembly, the plurality of elongate gas ports extending at least from an inner diameter region to an outer diameter region of the gas distribution assembly, the plurality of gas ports comprising a reactive gas port to deliver a reactive gas to the processing chamber, a purge gas port to deliver a purge gas to the processing chamber and a vacuum port to evacuate gases from the processing chamber;
- a heating module comprising a heat source, the heating module within the circular gas distribution assembly and having a wedge shape and the heat source comprises one or more of a lamp or a resistive heater;
- and
- a susceptor assembly within the processing chamber to rotate at least one substrate in a substantially circular path about a rotational axis, the susceptor assembly having a top surface defined by an inner peripheral edge and an outer peripheral edge, the susceptor assembly positioned below the gas distribution assembly so that the top surface of the susceptor assembly faces the front face of the gas distribution assembly.
1 more element
A processing chamber comprising:
- a slit valve to isolate an interior region of the processing chamber;
- a circular gas distribution assembly positioned within the processing chamber, the circular gas distribution assembly comprising a plurality of elongate wedge shaped gas ports in a front face of the gas distribution assembly, the plurality of elongate wedge shaped gas ports extending at least from an inner diameter region to an outer diameter region of the gas distribution assembly, the plurality of elongate wedge shaped gas ports comprising at least one reactive gas port to deliver at least one reactive gas to the processing chamber, at least one purge gas port to deliver a purge gas to the processing chamber and at least one vacuum port to evacuate gases from the processing chamber;
- a wedge shaped heating module comprising a heat source, the heating module located within the circular gas distribution assembly and adjacent the slit valve, the heat source comprising one or more of a lamp or a resistive heater;
- a susceptor assembly within the processing chamber to rotate at least one substrate in a substantially circular path about a rotational axis, the susceptor assembly having a top surface defined by an inner peripheral edge and an outer peripheral edge, the susceptor assembly positioned below the gas distribution assembly so that the top surface of the susceptor assembly faces the front face of the gas distribution assembly;
- and
- a heater located beneath the susceptor assembly to heat the susceptor assembly, the heater comprising one or more of a lamp or a resistive heater.
3 more elements
A processing chamber comprising:
- a circular gas distribution assembly positioned within the processing chamber, the circular gas distribution assembly comprising a plurality of elongate wedge shaped gas ports in a front face of the gas distribution assembly, the plurality of elongate wedge shaped gas ports extending at least from an inner diameter region to an outer diameter region of the gas distribution assembly, the plurality of elongate wedge shaped gas ports comprising at least one reactive gas port to deliver at least one reactive gas to the processing chamber, at least one purge gas port to deliver a purge gas to the processing chamber, at least one vacuum port to evacuate gases from the processing chamber, and at least one wedge shaped heating module comprising at least one lamp;
- a susceptor assembly within the processing chamber to rotate at least one substrate in a substantially circular path about a rotational axis, the susceptor assembly having a top surface defined by an inner peripheral edge and an outer peripheral edge, the susceptor assembly positioned below the gas distribution assembly so that the top surface of the susceptor assembly faces the front face of the gas distribution assembly;
- and
- a heater located beneath the susceptor assembly to heat the susceptor assembly, the heater comprising one or more of a lamp or a resistive heater.
1 more element
Dependencies are inferred from the claim text.