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US 2016/0097120 A1Published application
Variable conductance gas distribution apparatus and method
AssigneeASM IP Holding B.V.
InventorJohn Kevin Shugrue
Life of this patent
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Abstract
Variable conductance gas distribution systems, reactors and systems including the variable conductance gas distribution systems, and methods of using the variable conductance gas distribution systems, reactors, and systems are disclosed. The variable conductance gas distribution systems allow rapid manipulation of gas-flow conductance through the gas distribution system.
Claims20
A variable conductance gas distribution system comprising:
- a gas inlet;
- a first member having one or more first features;
- a second member having one or more second features;
- and
- a mechanism to move at least one of the first member and the second member relative to the other member to manipulate an amount of gas flow,
- wherein, when the gas distribution system is open, gas flows between the one or more first features and the one or more second features.
3 more elements
A gas-phase method, the method comprising the steps of:
- using a variable conductance gas distribution system, introducing a reactant gas to a reaction chamber of a reactor;
- moving a first member of the variable conductance gas distribution system relative to a second member of the variable conductance gas distribution system to increase fluid conductance of the variable conductance gas distribution system;
- and
- using the variable conductance gas distribution system, introducing a purge gas to a reaction chamber of a reactor.
1 more element
Dependencies are inferred from the claim text.