Planar cavity mems and related structures, methods of manufacture and design structures
AssigneeInternational Business Machines Corporation
InventorsChristopher V. JAHNES, Anthony K. STAMPER
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Abstract
A method of forming a Micro-Electro-Mechanical System (MEMS) includes forming a lower electrode on a first insulator layer within a cavity of the MEMS. The method further includes forming an upper electrode over another insulator material on top of the lower electrode which is at least partially in contact with the lower electrode. The forming of the lower electrode and the upper electrode includes adjusting a metal volume of the lower electrode and the upper electrode to modify beam bending.
Claims7
A Micro-Electro-Mechanical System (MEMS) structure comprising a moveable beam comprising at least one insulator layer on a lower electrode such that a volume of the lower electrode is adjusted to modify beam bending characteristics,
- wherein the modified beam bending characteristics are provided over a temperature range of about −55° C. to 125° C.
A Micro-Electro-Mechanical System (MEMS) structure comprising a moveable beam comprising at least one insulator layer on a lower electrode such that a volume of the lower electrode is adjusted to modify beam bending characteristics,
- wherein the moveable beam comprises the at least one insulator layer, the lower electrode, and an upper electrode contacting the lower electrode, and
- wherein the lower electrode and the upper electrode are asymmetric relative to one another.
Dependencies are inferred from the claim text.