US 2016/0096203 A1 · LIQUID PROCESSING METHOD, MEMORY MEDIUM AND LIQUID PROCESSING APPARATUS

Abstract

A liquid processing method for liquid-processing a substrate includes setting a substrate on a substrate holding device which rotates the substrate such that the substrate is held in horizontal position, supplying processing liquid to center portion of the substrate such that the center portion positioned center side with respect to peripheral portion of the substrate is liquid-processed, positioning a discharge port of a processing liquid nozzle toward downstream side in rotation direction such that the liquid is discharged to the peripheral portion obliquely to surface of the substrate and along tangential direction of the substrate while the substrate is rotated, and discharging gas from a gas nozzle perpendicularly to the surface of the substrate toward position that is adjacent to liquid landing position of the liquid on the surface of the substrate and is on the center side of the substrate, while the liquid is discharged to the peripheral portion.

Claims20

Dependent claims

A liquid processing method for liquid-processing a substrate, comprising:

setting a substrate on a substrate holding device configured to rotate the substrate such that the substrate is held in a horizontal position;
supplying a processing liquid to a center portion of the substrate such that the center portion positioned a center side with respect to a peripheral portion of the substrate is liquid-processed;
positioning a discharge port of a processing liquid nozzle toward a downstream side in a rotation direction of the substrate such that the processing liquid is discharged to the peripheral portion of the substrate obliquely with respect to a surface of the substrate and along a tangential direction of the substrate while the substrate is rotated;
and
discharging a gas from a gas nozzle perpendicularly with respect to the surface of the substrate toward a position that is adjacent to a liquid landing position of the processing liquid on the surface of the substrate and is on the center side of the substrate, while the processing liquid is discharged to the peripheral portion of the substrate.

2 more elements

A liquid processing apparatus for liquid-processing a substrate, comprising:

a substrate holding device configured to hold and rotate a substrate in a horizontal position;
a nozzle holding device holding a processing liquid nozzle and a gas nozzle, the processing liquid nozzle having a discharge port and configured to discharge a processing liquid from the discharge port such that the processing liquid is discharged obliquely with respect to a surface of the substrate, the gas nozzle configured to discharge a gas perpendicularly with respect to the surface of the substrate;
a moving device configured to move the nozzle holding device with respect to the surface of the substrate;
and
a control device comprising circuitry configured to control the nozzle holding device, the substrate holding device and the moving device such that while the substrate is rotated, the processing liquid is discharged to a peripheral portion of the substrate toward a downstream side in a rotation direction of the substrate and along a tangential direction of the substrate and a gas is discharged from the gas nozzle toward a position that is adjacent to a liquid landing position of the processing liquid on the surface of the substrate and is on a center side of the substrate.

2 more elements

Dependencies are inferred from the claim text.

Liquid processing method, memory medium and liquid processing apparatus

Life of this patent

Liquid processing method, memory medium and liquid processing apparatus

Life of this patent

Abstract

Claims20