Semiconductor device and formation thereof
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsCheng-Wei Luo, Hsiao-Tsung Yen
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Abstract
A semiconductor device and methods of formation are provided herein. A semiconductor device includes a conductor concentrically surrounding an insulator, and the insulator concentrically surrounding a column. The conductor, the insulator and the conductor are alternately configured to be a transistor, a resistor, or a capacitor. The column also functions as a via to send signals from a first layer to a second layer of the semiconductor device. The combination of via and at least one of a transistor, a capacitor, or a resistor in a semiconductor device decreases an area penalty as compared to a semiconductor device that has vias formed separately from at least one of a transistor, a capacitor, or resistor.
Claims20
A method of forming a semiconductor device comprising:
- forming an opening in a substrate;
- implanting a dopant into a sidewall of the substrate defining the opening to define a conductor concentrically surrounding the opening;
- forming an insulator within a portion of the opening adjacent a sidewall of the conductor, the insulator concentrically surrounding a remaining portion of the opening;
- and
- forming a column within the remaining portion of the opening, the insulator concentrically surrounding the column.
A method of forming a semiconductor device comprising:
- forming an opening in a substrate;
- forming an insulator within a portion of the opening adjacent a sidewall of the substrate, the insulator concentrically surrounding a remaining portion of the opening;
- forming a column within the remaining portion of the opening, the insulator concentrically surrounding the column;
- and
- implanting a dopant into a portion of the substrate adjacent the insulator.
A method of forming a semiconductor device comprising:
- implanting a dopant into a substrate to form a conductor;
- forming an opening in the conductor and the substrate, a remaining portion of the conductor concentrically surrounding the opening;
- forming an insulator adjacent a sidewall of the substrate defining the opening and adjacent a sidewall of the conductor defining the opening, the insulator concentrically surrounding a remaining portion of the opening and the remaining portion of the conductor concentrically surrounding the insulator;
- and
- forming a column within the remaining portion of the opening, the insulator concentrically surrounding the column.
Dependencies are inferred from the claim text.