Inductor structure with magnetic material and method for forming the same
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYuan-Tai TSENG, Ming-Chyi LIU, Chung-Yen CHOU, Chia-Shiung TSAI
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Abstract
The methods for forming an inductor structure are provided. The method includes forming an oxide layer over a substrate, and the layer includes an opening. The method includes forming a magnetic material over the oxide layer and in the opening and forming a patterned photoresist layer over the magnetic material, wherein the patterned photoresist layer overlaps the opening. The method further includes performing an etching process on the magnetic material using the patterned photoresist as a mask.
Claims20
A method for forming an inductor structure, comprising:
- forming an oxide layer over a substrate, wherein the layer comprises an opening;
- forming a magnetic material over the oxide layer and in the opening;
- forming a patterned photoresist layer over the magnetic material, wherein the patterned photoresist layer overlaps the opening;
- and
- performing an etching process on the magnetic material using the patterned photoresist as a mask.
A method for forming an inductor structure, comprising:
- forming a first metal layer over a substrate;
- forming an oxide layer over the first metal layer;
- and
- forming a magnetic material in the oxide layer, wherein the magnetic layer has a trapezoid structure in a cross section view or includes a recess on its top.
A method for forming an inductor structure, comprising:
- forming an oxide layer over a substrate, wherein the oxide layer comprises an opening;
- forming a magnetic material over the oxide layer and in the opening;
- forming a patterned photoresist layer over the magnetic material, wherein the patterned photoresist layer overlaps at least a portion of a top surface of the magnetic material in the opening;
- and
- performing a wet etching process on the magnetic material using the patterned photoresist layer as a mask.
Dependencies are inferred from the claim text.