Thin film transistor array substrate and frabricating method thereof, and liquid crystal display

A method for manufacturing a thin film transistor array substrate, comprising:

• A) forming a first metal layer in a pixel electrode layout area and a data electrode layout area using a first photo mask;
• B) depositing a first dielectric layer;
• C) forming a second metal layer on the first dielectric layer using a second photo mask;
• D) depositing a second dielectric layer;
• E) forming a via hole in a pixel electrode layout area of a second dielectric layer using a third photo mask;
• F) forming a transparent pixel electrode layer on the pixel electrode layout area of the second dielectric layer using a fourth photo mask, wherein the transparent pixel electrode layer is connected to the pixel electrode layout area of second metal layer via the via hole.

A liquid crystal display, comprising a thin film transistor array substrate, a second substrate opposite to the thin film transistor array substrate, and a liquid crystal layer interposed between the thin film transistor array substrate and the second substrate;

• the thin film transistor array substrate, comprising:
• a pixel electrode layout area and a data electrode layout area;
• the thin film transistor array substrate further comprising a transparent pixel electrode layer formed in the pixel electrode layout area, and further comprising a first metal layer, a first dielectric layer, an amorphous silicon layer, a second metal layer, a second dielectric layer formed in the pixel electrode layout are and the data electrode layout area;
• the first dielectric layer covering the first metal layer;
• the amorphous silicon layer, the second metal layer and the second dielectric being are sequentially formed on the first dielectric layer;
• the transparent pixel electrode layer being connected to the second metal layer via a via hole formed in the pixel electrode area of the second dielectric layer.