Nonvolatile semiconductor memory device and method of manufacturing the same
AssigneeKabushiki Kaisha Toshiba
InventorsHisashi KATO, Murato Kawai, Toru Matsuda, Takeshi Sonehara, Katsumi Iyanagi
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AssigneeKabushiki Kaisha Toshiba
InventorsHisashi KATO, Murato Kawai, Toru Matsuda, Takeshi Sonehara, Katsumi Iyanagi
Estimating the term…
The memory cell array includes a memory string and a select transistor. The memory string includes plural memory cells connected in series, the memory string being formed to extend in a first direction as a lengthwise direction. The select transistor is connected to one end of the memory string. In the wiring section, a conductive layer and an interlayer insulating layer are laminated alternately to form plural layers. The conductive layer functions as a gate electrode of the memory cells and the select transistor. One select transistor includes plural conductive layers, and the plural conductive layers are connected in common by a common first contact. The plurality of the conductive layers and the first contact include a barrier metal formed in a periphery thereof. The plurality of the conductive layers and the first contact are in contact without the barrier metal therebetween at a boundary thereof.
A nonvolatile semiconductor memory device, comprising:
A method of manufacturing a nonvolatile semiconductor memory device,
Dependencies are inferred from the claim text.