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US 2016/0079182 A1Published application
Method for processing a carrier and a carrier
OwnerTarja Hauck, Alessia Sciré +5inventors
InventorsTarja Hauck, Alessia Sciré, Dieter Kaiser, Andreas Greiner, Nicolo Morgana, Carolin Wetzig, Dietrich Burmeister
Life of this patent
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Abstract
A method for processing a carrier may include forming at least one recess structure at least one of over and in the carrier; and annealing the at least one recess structure such that at least one hollow chamber is formed by material of the at least one recess structure, wherein the at least one hollow chamber may form an optical alignment structure.
Claims20
A carrier comprising:
- at least one optical alignment structure formed by at least one hollow chamber arranged in the carrier.
A carrier comprising:
- at least one optical alignment structure formed by at least two hollow chambers arranged in the carrier, wherein a size of a first hollow chamber of the at least two hollow chambers is greater than a size of a second hollow chamber of the at least two hollow chambers.
A wafer comprising:
- at least one optical alignment structure formed by a plurality of hollow chambers arranged in the wafer, wherein a size of a first hollow chamber of the plurality of hollow chambers is greater than a size of a second hollow chamber of the plurality of hollow chambers.
Dependencies are inferred from the claim text.