Manufacturing method of semiconductor device
AssigneeKabushiki Kaisha Toshiba
InventorAkira TOMONO
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AssigneeKabushiki Kaisha Toshiba
InventorAkira TOMONO
Estimating the term…
A method for manufacturing a semiconductor device includes preparing a structure including a semiconductor substrate having a plurality of semiconductor elements thereon, a cover layer covering the semiconductor elements, a supporting substrate, and an adhesive layer between the first adhesive layer and the supporting substrate, removing side edge portions of the semiconductor substrate and the adhesive layer, such that a side surface of the cover layer is exposed, forming, in the supporting substrate, fragile portions, the fragile portions extending in a first direction, attaching an adhesive sheet on a surface of the supporting substrate that is opposite to a surface that is in contact with the adhesive layer, and pulling on the adhesive sheet in a second direction different from the first direction, to peel off the supporting substrate and the adhesive layer from the semiconductor substrate having the semiconductor elements.
A method for manufacturing a semiconductor device, comprising:
A method for manufacturing a semiconductor device, comprising:
Dependencies are inferred from the claim text.