Method and apparatus for manufacturing semiconductor devices
AssigneeKabushiki Kaisha Toshiba
InventorsMasaya SHIMA, Kenji TAKAHASHI
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AssigneeKabushiki Kaisha Toshiba
InventorsMasaya SHIMA, Kenji TAKAHASHI
Estimating the term…
A method of manufacturing a semiconductor device includes disposing a peel-off layer on the second surface of the first substrate, wherein the second surface of the first substrate comprises semiconductor integrated circuits, and the peel-off layer does not extend to an outer peripheral portion of the first substrate, bonding a second substrate to the peel-off layer via a bonding layer, attaching a tape onto the first surface of the first substrate, wherein the tape comprises an adhesive agent having an adhesive strength capable of being lowered by UV irradiation, irradiating a portion of the adhesive agent provided at the outer peripheral portion with UV rays directed toward the first surface, and separating the first substrate from the second substrate at the adhesive agent portion and the peel-off layer portion.
A method of manufacturing a semiconductor device on a first substrate having a first surface and second surface, comprising:
A semiconductor manufacturing apparatus comprising:
A semiconductor manufacturing apparatus comprising:
Dependencies are inferred from the claim text.