Sample cleaning apparatus and sample cleaning method

A sample cleaning apparatus, comprising:

• a vibrating unit which ultrasonically vibrates a sample while the sample is mounted and held on a sample stage arranged within a processing chamber, the vibrating unit comprising:
• a dielectric film which is arranged on the sample stage and above which the sample is mounted;
• first and second electrodes which are arranged electrically isolated from each other and adjacent to each other in the dielectric film;
• and
• a radio frequency power supply which supplies radio frequency power at frequencies in a prescribed range to the first and second electrodes while the sample is held on the sample stage;
• and
• a gas supply unit which forms a gas flow above the sample, in a direction along a surface of the sample, within the processing chamber so that particles, which are liberated from the surface of the sample, are expelled using the gas flow.